NASA 1996 SBIR Phase I

PROJECT TITLE : Thin Buried Oxide Densification for Low Power SIMOX SOI Substrate Applications

TECHNICAL ABSTRACT (LIMIT 200 WORDS)

Silicon-on-Insulator (SOI) technology achieves total dielectric isolation of active device regions from the substrate and reduces the collection path for ionized charges via the built-in buried oxide that restricts charge movement. Advances in SIMOX SOI technology include ULSI DRAMs for low voltage operation, thin film low power circuitry, radiation hardened memories, extreme temperature (400 C) circuitry, and gate arrays for satellite and space applications. A thin (~100nm) buried oxide (BOX) SIMOX product is under development in order to significantly reduce the cost of the substrates for commercial and military applications. However, the thin BOX SIMOX is presently too leaky for use. This Phase I proposal examines the feasibility of an innovative ramp rate process during the SIMOX substrate fabrication which preliminary in-house studies indicate densification of the thin buried oxide in the SOI substrates. In addition, an application of a recent high temperature anneal process published by the Japanese, in combination with the singular ramp rate, should further densify the thin buried oxide and reduce leakage from the surface to the bulk of the SOI substrate. Material quality will be assessed for production substates and for low power / low voltage circuitry in the Phase II effort. Realization and commercialization of the thin buried oxide SIMOX SOI is the ultimate goal of the program and a focus of the worldwide CMOS SOI industry.

The nation may expect to benefit from the development of a low cost, low power/low voltage thin BOX SIMOX substrate process. Wide scale production with a United States manufacturing base is predicted. Worldwide market share increase is anticipated with this SOI substrate development.

Dr. L.P. Allen,
Ibis Technology Corporation,
32A Cherry Hill Drive
Danvers, MA 01923

Ibis Technology Corporation,
32A Cherry Hill Drive
Danvers, MA 01923